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High-Accuracy Surface Figure Measurement of Silicon Mirrors at 80 K

机译:硅镜在80 K下的高精度表面图形测量

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摘要

This report describes the equipment, experimental methods, and first results at a new facility for interferometric measurement of cryogenically-cooled spherical mirrors at the Goddard Space Flight Center Optics Branch. The procedure, using standard phase-shifting interferometry, has an standard combined uncertainty of 3.6 nm rms in its representation of the two-dimensional surface figure error at 80, and an uncertainty of plus or minus 1 nm in the rms statistic itself. The first mirror tested was a concave spherical silicon foam-core mirror, with a clear aperture of 120 mm. The optic surface was measured at room temperature using standard absolute techniques; and then the change in surface figure error from room temperature to 80 K was measured. The mirror was cooled within a cryostat. and its surface figure error measured through a fused-silica window. The facility and techniques will be used to measure the surface figure error at 20K of prototype lightweight silicon carbide and Cesic mirrors developed by Galileo Avionica (Italy) for the European Space Agency (ESA).
机译:该报告介绍了戈达德太空飞行中心光学分公司用于低温冷却球面镜干涉测量的新设备的设备,实验方法和初步结果。该程序使用标准相移干涉术,在表示80度时的二维表面图形误差时,标准组合不确定度为3.6 nm rms,而rms统计信息本身的不确定度为正负1 nm。测试的第一面镜子是凹形球形硅泡沫芯镜,透明孔径为120 mm。使用标准绝对技术在室温下测量光学表面;然后测量从室温到80K的表面图形误差的变化。镜子在低温恒温器中冷却。并通过熔融石英窗口测量其表面图形误差。该设施和技术将用于测量由Galileo Avionica(意大利)为欧洲航天局(ESA)开发的原型轻质碳化硅和Cesic反射镜在20K时的表面图形误差。

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